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Ion Sources

Anode Layer Accelerator

The History

It was Askold Zharinov who found in 1956 phenomenon of ion acceleration by self-consistent electric field in gas discharge with azimuth electron drift. This idea is basic for wide generation of ion accelerators named as Anode Layer Accelerators.

Anode Layer Ion Rocket Engine was developed at the end of 60s as a result of research works of an anode layer processes carried out by Aleksei Morozov and Sergei Grishin. The first Anode Layer Rocket Engine was tested at 1971 and became a standard and widely used in Soviet/Russia space program till nowadays.

The main advantages are:

  • High Current Density and Specific Power
  • Absence of Electrostatic Extracting and Ion Optics Grids
  • Reliable and Simplicity of Servicing
The essentials of knowledge are presented in book Grishin S.D., Leskov L.V., Kozlov N.P. "Electric Rocket Engines" 1975 (and following editions).
Bauman Tech. Univ. is one of research center of Anode Layer Accelerators were Prof. Grishin S.D. and Prof. Kozlov N.P. held a chairs.

The idea of the using of the high intensive ion beam generated by Anode Layer Accelerators for technological applications and plasma chemistry appeared in 70s. The device named "Radical" was developed given an impetus to engineering activity.

The Sketch of Accelerator's Design

 

The Fundamental

The strong magnetic field traps electrons in the electrodes gap but electrons oscillate and drift in the direction perpendicular to ExB plane in the presence of crossed with B electric field E. Near anode plasma region is created due to intense ionization by oscillated electrons. Ions accelerated by the Je x B force through the plasma region leave the gap essentially neutralized.

Beam Focusing

It is possible to control beam focusing and electric field distribution by adjustment a spatial configuration of magnetic field in discharge gap area.

 

See also: 100 mA Ion Source Set>>

 

Fields of Application

  • Ion Sputtering
  • Ion Assistance
  • Non-reactive and Reactive Ion Etching
  • Ion Beam Cleaning
  • Ion Milling
  • Direct Deposition of DLC, SiOx etc.
Ion Beam: Various Gases, Different Current

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