3D Ion Implantation is a treatment method according to which
high energy ion flow on workpiece is formed directly from
pulse discharge between vacuum chamber (anode) and the workpiece
(cathode). Ions that are being accelerated in thin voltage
drop near the cathode modify complex-shaped surface of the
part. Electron beams are generated from surface of the cathode
by falling ions and provide self-sustain of discharge via
interaction with plasma.