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MULTILAYERS

Nanoscale supermultilayers structures demonstrate a new properties.

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Implant Picture

3D ION IMPLANTATION

3D Ion Implantation is a treatment method according to which high energy ion flow on workpiece is formed directly from pulse discharge between vacuum chamber (anode) and the workpiece (cathode). Ions that are being accelerated in thin voltage drop near the cathode modify complex-shaped surface of the part. Electron beams are generated from surface of the cathode by falling ions and provide self-sustain of discharge via interaction with plasma.

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CHCPA

Compact High Current Plasma Accelerator is based on unique physics phenomenon - ion current transfer.
Accelerated ions flow is emitted from special Anode Ionizing chamber.

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